管式等离子体多晶硅薄膜淀积炉
设备名称 Equipment Name
管式等离子体多晶硅薄膜淀积炉 Horizontal PECVD (poly-Si)
设备型号 Equipment Model
PD-520
设备用途 Equipment Application
本设备主要用于N-TOPCon电池制备隧穿氧化层、本征poly-si、掺杂poly-si、掩膜层。
This equipment is mainly used for the deposition of tunnel oxide layer, intrinsic poly-si layer, poly-si layer doping and mask layer for TOPCon solar cells.
工艺流程 Process Flow
石墨舟及硅片准备→管内充氮气→进舟→抽真空、压力测试→淀积多层复合膜→抽真空、压力测试→清管路、充氮气→退舟
Graphite boat & wafers ready→nitrogen inlet→graphite boat load in→vacuumize, pressure test→multi layers deposition→vacuumize, pressure test→Pipe purging, nitrogen inlet→graphite boat unload
技术特点 Features
1、隧穿氧化层、本征poly-Si、掺杂poly-Si、掩膜层，四种工艺薄膜一次原位完成。
Tunnel oxide layer, intrinsic Poly-Si, doping Poly-Si, mask layer, four processes completed in one in-situ doping.
2、具备原位清洗功能。
With in-situ clean.
3、双水冷密封技术。
Double water-cooled sealing technology.
4、专利内加热技术。
Patented internal heating technology.
5、高速平稳整体模组推舟机构。
High-speed integral module boat pushing mechanism.
6、悬浮承载舟技术。
Graphite boat contact-free with quartz tube.
7、自主知识产权MES软件。
MES software with independent intellectual property right.
8、自主开发中央计算机集中控制系统。
Independently developed CCC system.
9、快速镀膜技术。
Fast coating technology.
10、全面的防超温、断偶、撞舟等安全报警保护功能。
Alarm protection for over-heating, thermocouple-break and boat collision.
设备参数 Parameters
